KUUAB ™ XUUS ™ Extreme UV sources

  • Description
  • Specification


From a pioneer in robust, engineered EUV systems.

The good news: you no longer need to devote laboratory resources to building a system for high harmonic generation (HHG). The fourth generation of the KUUAB ™ XUUS ™ Extreme UV ultrafast source is a turnkey system that will take the hassle out of running an experiment. XUUS4 is a coherent EUV / soft X-ray light source based on high harmonic generation. It is a fully integrated commercial source based on a single robust opto-mechanical platform.

XUUS4 converts ultrafast laser pulses into extreme UV (EUV or XUV) or soft X-ray regions of the spectrum. Using HHG processes, the output beam inherits the coherent properties of a guiding laser, such as: KMLabs RAEA, with a wavelength that can be tuned from ~10 to 47 nm. In addition, custom systems can generate coherent beams with wavelengths as short as 6.5 nm. XUUS4 uses KMLabs’ patented hollow waveguide for the high harmonic up-conversion process.

The architecture of the XUUS hollow core or waveguide allows the harmonics generated by the system to be distinguished from other HHG methods, ensuring that the harmonics arise from the same point in space each time, minimizing pointing drift. This optimizes the repeatability of your experiments. In addition, using a fiber instead of the typical gas jet geometry or partially infinite geometry of the target gas cell provides better pressure control for phase-matched HHG. Now you can choose robustness without sacrificing flexibility.


  • Patented high harmonic conversion in waveguide for optimal conversion, stability, repeatability and robustness.
  • EUV flux can exceed> 1 × 1012 ph / s for the most demanding applications
  • Ultra-stable 4-axis active beam stabilization, generating EUV beam intensity and wavefront stability comparable to visible infrared lasers
  • High average power transfer capability for next-generation experiments
  • Diagnostic cameras for performance monitoring and alignment control
  • Graphical, intuitive control software
  • Stable industrial optical mounting on a temperature-stabilized platform
  • Growing family of application-specific beamlines delivering photons tailored to the experiment
  • Highly coherent, similar to an EUV (XUV) / SXR laser
  • Custom XUUS systems to generate soft X-rays down to ~6 nm wavelengths
  • Waveguide design allows efficient use of high-pressure gas with minimal gas consumption: 1,000 times less than for standard gas jet geometry and up to 100 times higher efficiency
  • XUUS can be optimized for a variety of applications: ARPES, imaging, transient absorption, MOKE, XMCD


WavelengthStreamFrequency of repetitionSpot stabilityPower stability
30 nm>5×1012 ph/sec per harmonic1 – 20<5 µrad RMS<5% RMS
13 nm>1010 ph/sec per harmonic1 – 10<5 µrad RMS<5% RMS
6 nm>106 ph/sec per 10% BW1<10 µrad RMS<10% RMS